This core lab is currently equipped with two state-of-the-art Molecular Beam Epitaxy (MBE) reactors to provide semiconductor wafer growth foundry services. MBE-I is designed for providing (In, Ga, Al – As, Sb) epitaxial wafers, while MBE-II is designed to provide (In, Ga, Al – N) epitaxial wafers. This is the only (III-As / Sb + III-N) combined MBE system at UCLA. Our strengths in nanomaterial synthesis include growth of nanowires, quantum dots, and semiconductor films in the thickness of a single atom level.
Integrated Systems Nanofabrication Cleanroom (ISNC)
The Integrated Systems Nanofabrication Cleanroom (ISNC) consists of 8,900 square feet of vertical-flow clean room space comprising 4 class 100 bays and 8 class 1,000 bays, 2 of which form a biology suite with its own dedicated air flow system. A full complement of utilities including high purity DI water, high purity nitrogen, reactive gases, chilled water etc. are available to each process bay. The ISNC integrates classic semiconductor tools and processes with biological, chemical, and medical substrates to extend beyond more traditional nano-device fabrication such as integrated circuits, quantum dots, single electron transistors, nanotips etc. toward DNA, single molecules, proteins and a host of other biologically relevant nanosystems. By proper process design and equipment selection, the ISNC provides the opportunity to successfully join standard process techniques with evolving bio-medical and nanoscale fabrication applications.
Nanoelectronics Research Facility (NRF)
The UCLA Nanoelectronics Research Facility (NRF) offer expertise in micro and nano-technology fabrication equipment, as well as professionally managed use of cleanroom facilities to UCLA researchers, industry users, and other interested parties.